Reflection Capture access in PPS

I was trying to find a way of reading the reflection capture in a post processing shader, but failed to find any information about it. Is there a way to do it ?

Background:
I’m writing a special cartoon PP shader that tints all Fresnel values (in all directions) in any level area with the color of the surroundings of that particular area -> kind of global illumination applied only to Fresnel. I know I can sample the frame buffer (pp-input-0) for the visible hemisphere and build an illumination average, but that approach would be too costly (16 samples per pixel every frame etc…) and also inaccurate since dependent on the visible frustum only. Also, tracing rays is also something I want to avoid due to high cost - thinking of mobile and old consoles.

What I would love to do is just access the reflection cube-map in mipmap level max and use it for color tinting the Fresnel. But I cannot find how to access any reflection information in a post processing shader. There is also a screen space global illumination setting in UE4 so there has to be a way to access illumination maps in post processing.

Does anyone have an idea please?

Noone? Is there really no way to access light information (lights, light buffer, light probes etc) from a PP Shader?

That sounds rather advanced, though I’m a beginner in Unreal yet. If the capability is there, there would probably be instructions in a UDK article somewhere in the help docs. Either that, or try stackoverflow or stackexchange in an Unreal channel. Even far more basic questions don’t get answered in these forums, and I’m not sure why.

There is a section of the docs, and at least one course in the online learning center for Unreal, that are about developing shaders. I’d suggest searching those first as it’s likely after a month of having asked this question that no one is going to answer.

reflection captures are processed in the base pass and the reflection capture array is not even exposed to the material editor. so no, there is no way to access the reflection captures in a post process material